X-ray photoelectron spectroscopy (XPS) analyses confirmed the formation of different oxides upon thermal air oxidation (TO) of Ni60Nb30Ta10 metallic glass (MG) below the glass transition temperature. At 450 °C (450 TO-MG), surface of the oxide film was enriched with Nb2O5 (65%) and Ta2O5 (26%). Similarly, at 550 °C (550 TO-MG), the upper oxide layer was composed with NiO (67%), Ni2O3 (28.5%) and small fraction metallic Ni (4.5%). The electrochemical corrosion behavior of the thermally oxidized metallic glass samples was studied in 1, 6 and 11.5 M nitric acid at room temperature. Mott-Schottky analyses in nitric acid solutions confirmed the n-type semiconducting nature of the film for as-spun MG. On the other hand, the films formed on 450 TO-MG, and 550 TO-MG exhibited insulating and p-type, respectively. The donor (n-type) and acceptor (p-type) densities increases as the solution concentration increased. In nitric acid solutions, the current densities values obtained from potentiodynamic polarization studies indicated that 450 TO-MG exhibited higher corrosion resistance than the as-spun and 550 TO-MG samples.